The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Mar. 30, 2016
Jgc Catalysts and Chemicals Ltd., Kawasaki-shi, JP;
Yuji Tawarazako, Kitakyushu, JP;
Yoshinori Wakamiya, Kitakyushu, JP;
Shingo Kashiwada, Kitakyushu, JP;
Kazuaki Inoue, Kitakyushu, JP;
Kazuhiro Nakayama, Kitakyushu, JP;
Michio Komatsu, Kitakyushu, JP;
JGC Catalysts and Chemicals Ltd., Kawasaki-shi, JP;
Abstract
A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.