The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
May. 15, 2017
Applicant:
Purdue Research Foundation, West Lafayette, IN (US);
Inventors:
Kevin Michael Keener, Ames, IA (US);
Nikhil K Mahnot, Assam, IN;
Assignee:
Purdue Research Foundation, West Lafayette, IN (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61L 2/14 (2006.01); A23L 2/02 (2006.01); A23L 2/50 (2006.01); A23L 3/26 (2006.01); A61L 2/00 (2006.01); C02F 1/46 (2006.01); H05H 1/24 (2006.01); H05H 1/00 (2006.01);
U.S. Cl.
CPC ...
A61L 2/14 (2013.01); A23L 2/02 (2013.01); A23L 2/50 (2013.01); A23L 3/26 (2013.01); A61L 2/0011 (2013.01); C02F 1/4608 (2013.01); H05H 1/00 (2013.01); H05H 1/2406 (2013.01); A23V 2002/00 (2013.01); A61L 2202/11 (2013.01); A61L 2202/21 (2013.01); C02F 2303/04 (2013.01); H05H 2001/2412 (2013.01);
Abstract
This present invention generally relates to a process for manipulating the chemistry of a product using high voltage atmospheric cold plasma (HVACP) in the presence of a working gas, and in particular to a process for inactivating pathogenic microorganisms in a liquid product by adding an acidic component to or adjusting an acidic component of a product in combination with HVACP treatment. A product of this process is also in the scope of this disclosure.