The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jul. 28, 2017
Shimadzu Corporation, Kyoto, JP;
Osaka University, Suita-shi, JP;
Satoshi Sano, Kyoto, JP;
Koichi Tanabe, Kyoto, JP;
Toshinori Yoshimuta, Kyoto, JP;
Kenji Kimura, Kyoto, JP;
Hiroyuki Kishihara, Kyoto, JP;
Yukihisa Wada, Kyoto, JP;
Takuro Izumi, Kyoto, JP;
Taro Shirai, Kyoto, JP;
Takahiro Doki, Kyoto, JP;
Akira Horiba, Kyoto, JP;
Takayoshi Shimura, Suita, JP;
Heiji Watanabe, Suita, JP;
Takuji Hosoi, Suita, JP;
Shimadzu Corporation, Nishinokyo-Kuwabaracho, Nakagyo-ku, Kyoto-shi, Kyoto, JP;
Osaka University, Yamadaoka, Suita-shi, Osaka, JP;
Abstract
An X-ray phase contrast imaging device of the present invention can change an arrangement pitch of slits related to a multi-slit and an arrangement pitch of phase shift sections related to a phase grating. A positional relationship among the multi-slit, the phase grating, and an FPD is determined based on the arrangement pitch of the slits related to the multi-slit, the arrangement pitch of the phase shift sections related to the phase grating, and an arrangement pitch of detection elements related to the FPD. Among these arrangement pitches, by changing the arrangement pitch of the slits and the arrangement pitch of the phase shift sections, the present invention can change the positional relationship among the multi-slit, the phase grating, and the FPD.