The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

May. 11, 2017
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Tsuyoshi Kachi, Ibaraki, JP;

Yoshinori Hoshino, Ibaraki, JP;

Senichirou Nagase, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 21/265 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 29/861 (2006.01); H01L 29/66 (2006.01); H01L 29/15 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76237 (2013.01); H01L 21/26586 (2013.01); H01L 29/0634 (2013.01); H01L 29/0649 (2013.01); H01L 29/0688 (2013.01); H01L 29/0696 (2013.01); H01L 29/157 (2013.01); H01L 29/158 (2013.01); H01L 29/4236 (2013.01); H01L 29/66348 (2013.01); H01L 29/66734 (2013.01); H01L 29/7397 (2013.01); H01L 29/7813 (2013.01); H01L 29/861 (2013.01);
Abstract

Provided are a semiconductor device and a manufacturing method therefor that can prevent the breakage of an element and in which the control of impurity amounts is less susceptible to variations in manufacturing processes. A semiconductor substrate has a front surface and includes hole portions extending from the front surface to an inside of the substrate. N-type regions are formed in the semiconductor substrate. At wall surfaces of the hole portions, p-type regions are formed to configure p-n junction with the n-type regions. Each of the p-type regions includes a low-concentration region and a high-concentration region formed at the wall surface of each hole portion. A width of the high-concentration region along the wall surface of the hole portion becomes smaller from the front surface toward a deeper position.


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