The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
May. 13, 2016
Applicant:
President and Fellows of Harvard College, Cambridge, MA (US);
Inventors:
Haig Avedis Atikian, Somerville, MA (US);
Marko Loncar, Cambridge, MA (US);
Assignee:
President and Fellows of Harvard College, Cambridge, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/3065 (2006.01); B81C 99/00 (2010.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); B81C 99/0095 (2013.01); B81B 2207/053 (2013.01); B81B 2207/056 (2013.01); B81C 2201/0143 (2013.01); B81C 2201/038 (2013.01); B81C 2201/056 (2013.01);
Abstract
A method for fabrication of free standing mechanical and photonic structures is presented. A resist mask is applied to a bulk substrate. The bulk substrate is attached to a movable platform. The bulk substrate is exposed to an ion stream produced by a reactive ion beam etching source. The platform is moved relative to the ion stream to facilitate undercutting a portion of the bulk substrate otherwise shielded by the mask.