The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Apr. 26, 2019
Applicants:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., München, DE;

Friedrich-schiller-universität Jena, Jena, DE;

Inventors:

Sven Schröder, Jena, DE;

Nadja Felde, Jena, DE;

Luisa Coriand, Jena, DE;

Marcus Trost, Jena, DE;

Gunther Notni, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G02B 1/18 (2015.01);
U.S. Cl.
CPC ...
G21K 1/062 (2013.01); G02B 1/18 (2015.01);
Abstract

A contamination-repellent mirror and a method for producing the same. In an embodiment a contamination-repellent mirror includes a mirror layer disposed on a substrate, wherein the mirror layer has a reflection maximum in a wavelength range between 1 nm and 50 nm, a nanorough layer arranged on the mirror layer, wherein the nanorough layer has an rms roughness between 1 nm and 50 nm, and wherein a hygrophobic cover layer is arranged on the nanorough layer or the nanorough layer comprises a hygrophobic material.


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