The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Sep. 04, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masato Homma, Utsunomiya, JP;

Izumi Kawahara, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01);
Abstract

The present invention provides an exposure apparatus which exposes a substrate while scanning an original and the substrate, comprising: a stage that includes a first surface in which a first concave portion and a second concave portion to be supplied with a purge gas are formed, and is movable while holding the original; and a member including a second surface facing the first surface, wherein the first concave portion is provided in the first surface of the stage so as to define a first space in which the original is arranged, and at least one second concave portion is provided outside the first concave portion in the first surface of the stage so as to define a second space having a smaller volume than the first space.


Find Patent Forward Citations

Homma, Masato. (2020). Exposure apparatus and method of manufacturing article (U.S. Patent No. 10725388). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10725388

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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