The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Sep. 13, 2018
Applicant:

Stmicroelectronics S.r.l., Agrate Brianza, IT;

Inventors:

Roberto Carminati, Piancogno, IT;

Enri Duqi, Milan, IT;

Sebastiano Conti, Pregnana Milanese, IT;

Assignee:

STMICROELECTRONICS S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 3/08 (2006.01); G02B 26/08 (2006.01); H02M 1/12 (2006.01); H02M 1/15 (2006.01); B81B 7/00 (2006.01); G02B 26/10 (2006.01); B81B 3/00 (2006.01); G05F 3/26 (2006.01); H02M 1/42 (2007.01); H02M 3/335 (2006.01); H04N 9/31 (2006.01); H02M 1/00 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0833 (2013.01); B81B 3/0045 (2013.01); B81B 7/008 (2013.01); G02B 26/0841 (2013.01); G02B 26/101 (2013.01); G05F 3/26 (2013.01); H02M 1/12 (2013.01); H02M 1/15 (2013.01); H02M 1/42 (2013.01); H02M 3/33507 (2013.01); H04N 9/3155 (2013.01); H04N 9/3173 (2013.01); B81B 2201/042 (2013.01); B81B 2203/0315 (2013.01); B81B 2203/056 (2013.01); H02M 1/4225 (2013.01); H02M 1/4258 (2013.01); H02M 2001/0025 (2013.01); H02M 2001/0032 (2013.01); Y02B 70/126 (2013.01); Y02B 70/16 (2013.01);
Abstract

A micro-electro-mechanical device, wherein a platform is formed in a top substrate and is configured to turn through a rotation angle. The platform has a slit and faces a cavity. A plurality of integrated photodetectors is formed in a bottom substrate so as to detect the light through the slit and generate signals correlated to the light through the slit. The area of the slit varies with the rotation angle of the platform and causes diffraction, more or less marked as a function of the angle. The difference between the signals of two photodetectors arranged at different positions with respect to the slit yields the angle.


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