The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Sep. 07, 2017
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Maurice J. Halmos, Encino, CA (US);

Joseph Marron, Manhattan Beach, CA (US);

Jae H. Kyung, Redondo Beach, CA (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 3/08 (2006.01); G01S 7/4865 (2020.01); G01S 7/481 (2006.01); G01S 17/58 (2006.01); G01S 17/10 (2020.01); G01S 7/4861 (2020.01); G01S 7/484 (2006.01); G01S 7/487 (2006.01); G01S 7/48 (2006.01);
U.S. Cl.
CPC ...
G01S 7/4865 (2013.01); G01S 7/484 (2013.01); G01S 7/487 (2013.01); G01S 7/4808 (2013.01); G01S 7/4811 (2013.01); G01S 7/4814 (2013.01); G01S 7/4816 (2013.01); G01S 7/4861 (2013.01); G01S 17/10 (2013.01); G01S 17/58 (2013.01);
Abstract

A method includes generating a first optical signal containing doublet pulses. Each doublet pulse includes a first pulse and a second pulse. The second pulses of the doublet pulses are in quadrature with the first pulses of the doublet pulses. The method also includes transmitting the first optical signal towards a target and receiving a second optical signal containing reflected doublet pulses from the target. Each reflected doublet pulse includes a first reflected pulse and a second reflected pulse. The method further includes performing in-phase and quadrature processing of the first and second reflected pulses and identifying one or more parameters of the target based on the in-phase and quadrature processing.


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