The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Jan. 04, 2019
Research Foundation of the City University of New York, New York, NY (US);
Carlos A. Meriles, Fort Lee, NJ (US);
Daniela Pagliero, Fort Lee, NJ (US);
Abdelghani Laraoui, Bronx, NY (US);
Research Foundation of the City University of New York, New York, NY (US);
Abstract
A method of inducing spin polarization in an analyte is provided. The method exposesN spin defect centers embedded within 25 nm of a diamond surface to a magnetic field while an analyte is near the surface. TheN spin defect centers are polarized by treatment with an electromagnetic wave protocol having a visible light pulse (p); a microwave pulse (mw), a radio frequency pulse (rf), a microwave pulse (mw) and a radio frequency pulse (rf) resulting in polarization of the nuclear spins of theN spin defect centers. Polarized spins in theN spin defect centers induce spin polarization in the analyte.