The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Apr. 16, 2019
Applicant:
Toppan Printing Co., Ltd., Tokyo, JP;
Inventor:
Eiichi Higashikawa, Tokyo, JP;
Assignee:
TOPPAN PRINTING CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/54 (2014.01); D21H 27/18 (2006.01); D21H 19/40 (2006.01); D21H 19/38 (2006.01); D21H 19/82 (2006.01); E04F 13/07 (2006.01); E04F 13/08 (2006.01); D21H 21/52 (2006.01); D21H 21/28 (2006.01); B32B 27/00 (2006.01); B32B 27/18 (2006.01); B05D 5/02 (2006.01); C09D 11/037 (2014.01); C09D 11/107 (2014.01); C09C 3/06 (2006.01); C09C 1/28 (2006.01); C09D 11/02 (2014.01);
U.S. Cl.
CPC ...
C09D 11/54 (2013.01); B05D 5/02 (2013.01); B32B 27/00 (2013.01); B32B 27/18 (2013.01); C09D 11/037 (2013.01); C09D 11/107 (2013.01); D21H 19/38 (2013.01); D21H 19/40 (2013.01); D21H 19/82 (2013.01); D21H 21/28 (2013.01); D21H 21/52 (2013.01); D21H 27/18 (2013.01); E04F 13/07 (2013.01); E04F 13/08 (2013.01); E04F 13/0866 (2013.01); E04F 13/0873 (2013.01); C09C 1/28 (2013.01); C09C 3/063 (2013.01); C09D 11/02 (2013.01); Y10T 428/24876 (2015.01);
Abstract
A decorative material having first and second gloss-adjusting layers, one with lower gloss contains a matting agent having an average particle diameter of 6.0 μm or more and 15.0 μm or less. That is, the average particle diameter of the matting agent in the gloss-adjusting layer with lower gloss, i.e., the gloss-adjusting layer whose scratch resistance is likely to be low, is set within an optimal range in which the gloss-adjusting layer has improved or even excellent scratch resistance and designability.