The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Dec. 19, 2017
University of South Carolina, Columbia, SC (US);
Amrita Sarkar, Columbia, SC (US);
Morgan Stefik, Columbia, SC (US);
Chuanbing Tang, Columbia, SC (US);
University of South Carolina, Columbia, SC (US);
Abstract
A trifluoroacetic acid-based etchant is described that can remove a sacrificial component of a multi-component polymer, e.g., a self-assembled block copolymer. The etchant can operate at a high etch rate and with excellent selectivity. The etchant can remove a hydrolysable sacrificial component such as a polylactide block from a self-assembled block copolymer. The etchant enables the macroscopic preservation of the nanostructure morphologies of self-assembled copolymers (e.g., poly(styrene-block-lactide) copolymers) and can yield pristine porous films of the non-hydrolysable component of the starting multi-component polymer.