The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Oct. 31, 2017
Applicant:

DE LA Rue International Limited, Basingstoke, Hampshire, GB;

Inventor:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 25/324 (2014.01); B42D 25/36 (2014.01); B32B 1/00 (2006.01); B42D 25/29 (2014.01); B42D 25/328 (2014.01); B42D 25/355 (2014.01); B42D 25/373 (2014.01); B32B 1/04 (2006.01);
U.S. Cl.
CPC ...
B42D 25/324 (2014.10); B32B 1/00 (2013.01); B32B 1/04 (2013.01); B42D 25/29 (2014.10); B42D 25/328 (2014.10); B42D 25/355 (2014.10); B42D 25/36 (2014.10); B42D 25/373 (2014.10); B32B 2425/00 (2013.01); B32B 2554/00 (2013.01);
Abstract

A method of manufacturing a security device is provided. The method comprises providing a substrate, the substrate having opposing first and second surfaces and a relief structure formed in the first surface of the substrate. A reflection enhancing layer is applied over the first surface of the substrate such that the reflection enhancing layer at least partially overlaps the relief structure and such that a first region of the first surface of the substrate does not have the reflection enhancing layer. An absorber layer is applied over the reflection enhancing layer such that the absorber layer at least partially overlaps the reflection enhancing layer and the relief structure where the reflection enhancing layer and the relief structure overlap each other, and such that the absorber layer at least partially overlaps the first region of the first surface of the substrate. An optical spacer layer is applied over the absorber layer such that the optical spacer layer at least partially overlaps the absorber layer, reflection enhancing layer and the relief structure where the absorber layer, reflection enhancing layer and the relief structure overlap each other, and such that the optical spacer layer at least partially overlaps the absorber layer and the first region where the absorber layer and the first region overlap each other. A reflector layer, formed of an at least partially reflective material, is applied over the optical spacer layer such that the reflector layer at least partially overlaps the optical spacer layer, the absorber layer, the reflection enhancing layer and the relief structure where the optical spacer layer, the absorber layer, the reflection enhancing layer and the relief structure overlap each other, and such that the reflector layer at least partially overlaps the optical spacer layer, the absorber layer and the first region where the optical spacer layer, the absorber layer and the first region overlap each other. The reflection enhancing layer and the absorber layer are formed of the same material. The absorber layer, the optical spacer layer and the reflector layer, together, form a colour-shifting structure. The reflection enhancing layer and the absorber layer, together, are substantially opaque or transmit less than 40% of incident light, preferably less than 20% of incident light.


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