The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Jan. 23, 2018
Applicant:

Ferro Corporation, Mayfield Heights, OH (US);

Inventors:

Joseph E. Sarver, Washington, PA (US);

Nicholas M. Karpa, Pittsburgh, PA (US);

Dennis R. Gilmore, Washington, PA (US);

George E. Sakoske, Independence, OH (US);

Assignee:

Ferro Corporation, Mayfield Heights, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41M 5/26 (2006.01); G03F 7/004 (2006.01); C01B 33/06 (2006.01); C01B 32/90 (2017.01); C01B 32/956 (2017.01); C01B 32/935 (2017.01); C01B 32/942 (2017.01); C01B 32/914 (2017.01); C01B 21/06 (2006.01); C01G 39/00 (2006.01); C09C 1/34 (2006.01); C09C 3/04 (2006.01); C01G 49/00 (2006.01);
U.S. Cl.
CPC ...
B41M 5/267 (2013.01); B41M 5/26 (2013.01); C09C 1/34 (2013.01); C09C 3/04 (2013.01); G03F 7/0042 (2013.01); C01B 21/062 (2013.01); C01B 21/0622 (2013.01); C01B 32/90 (2017.08); C01B 33/06 (2013.01); C01G 39/00 (2013.01); C01G 49/00 (2013.01); C01P 2006/62 (2013.01); C01P 2006/63 (2013.01); C01P 2006/64 (2013.01);
Abstract

A universal or all-purpose laser marking composition for forming satisfactorily dark laser marks on a wide variety of substrates is provided. The marking composition comprises an enhancer of nitrides, carbides, silicides, and combinations thereof. The enhancer may be selected one or more of ferromanganese, ferrosilicon, FeSiwhere X can range from about 0.005 to 0.995, FeSi, MgFeSi, SiC, CaSi, (Co)Mo, MoSi, TiSi, ZrSi, WSi, MnSi, YSi, CuSi, NiSi, FeC, FeCand FeC, MoC, MoC, MoC, YC, WC, AlC, MgC, MgC, CaC, LaC, TaC, FeN, FeN, FeN, FeN, FeN, MoN, MoN, WN, WN, WN, and combinations thereof and combinations thereof. Upon disposing the marking composition on a substrate and exposing the marking composition to laser radiation, the marking composition absorbs the laser radiation, increases in temperature, chemically bonds with the substrate, and when formed on each of a metal, glass, ceramic, stone, and plastic substrates, the mark has a negative ΔL dark contrast value of at least −1 compared to a mark formed by the marking composition without the enhancer.


Find Patent Forward Citations

Loading…