The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Sep. 06, 2019
Applicant:

Stamicarbon B.v., Sittard, NL;

Inventors:

Brian Sayre Higgins, American Canyon, CA (US);

John Marshall Tate, III, Sittard, NL;

Robert Arthur Yates, Sittard, NL;

Marcel Julien Pomerleau, Sittard, NL;

Jon Michael Heon, Sittard, NL;

Wilfried Marc Renatt Dirkx, Sittard, NL;

Juan Coloma González, Sittard, NL;

Assignee:

Stamicarbon B.V., Sittard, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 47/05 (2006.01); B01D 47/06 (2006.01); B01D 47/10 (2006.01); B01D 47/12 (2006.01); B01D 47/00 (2006.01); B01D 53/40 (2006.01); B01D 53/58 (2006.01); B01D 53/79 (2006.01); B01J 2/04 (2006.01); C07C 273/16 (2006.01); C05C 9/00 (2006.01);
U.S. Cl.
CPC ...
B01D 47/10 (2013.01); B01D 47/05 (2013.01); B01D 47/06 (2013.01); B01D 47/12 (2013.01); B01D 53/40 (2013.01); B01D 53/58 (2013.01); B01D 53/79 (2013.01); B01J 2/04 (2013.01); C05C 9/005 (2013.01); C07C 273/16 (2013.01); B01D 2247/106 (2013.01); B01D 2251/206 (2013.01); B01D 2251/2067 (2013.01); B01D 2251/304 (2013.01); B01D 2251/402 (2013.01); B01D 2251/404 (2013.01); B01D 2251/50 (2013.01); B01D 2251/502 (2013.01); B01D 2251/504 (2013.01); B01D 2251/506 (2013.01); B01D 2251/602 (2013.01); B01D 2251/604 (2013.01); B01D 2251/606 (2013.01); B01D 2251/70 (2013.01); B01D 2258/02 (2013.01); Y02P 20/582 (2015.11);
Abstract

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h)/(m/h).


Find Patent Forward Citations

Higgins, Brian. (2020). Submicron particle removal from gas streams (U.S. Patent No. 10722831). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10722831

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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