The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Jun. 27, 2019
Applicant:

Zhejiang Dahua Technology Co., Ltd., Hangzhou, Zhejiang, CN;

Inventors:

Yanfen Zhou, Hangzhou, CN;

Runfa Pan, Hangzhou, CN;

Liangcheng Li, Hangzhou, CN;

Qianfeng Huang, Hangzhou, CN;

Erli Lu, Hangzhou, CN;

Mingzhu Chen, Hangzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/235 (2006.01);
U.S. Cl.
CPC ...
H04N 5/2353 (2013.01); H04N 5/2351 (2013.01); H04N 5/2355 (2013.01);
Abstract

The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.


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