Horizontal current bipolar transistor with floating field regions

Abstract

A horizontal current bipolar transistor comprises; an n-hill layer on a substrate, forming a first pn-junction with the substrate; a n+ diffusion layer on the substrate, adjacent to the n-hill layer, forming a n+n junction with the n-hill layer; an intrinsic base layer on the n-hill layer and comprising a portion of a sidewall inclined at an acute angle to the substrate plane, forming a second pn-junction with the n-hill layer; an extrinsic base layer on the n-hill layer, forming a third pn-junction with the n-hill layer, and a pp junction with the intrinsic base layer; a field limiting region on the n-hill layer, forming a fourth pn-junction with the n-hill layer. The field limiting region is spatially separated from the extrinsic base layer and the n+ diffusion layer. The extrinsic base layer and the field limiting region exhibit substantially equal impurity dopant distribution decay towards the substrate.