The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2020

Filed:

Nov. 24, 2016
Applicant:

Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;

Inventors:

Li Zhao, Shenzhen, CN;

Bangyin Peng, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G02F 1/1333 (2006.01); G02F 1/13 (2006.01); G02F 1/1334 (2006.01); G03F 1/32 (2012.01); G03F 1/42 (2012.01);
U.S. Cl.
CPC ...
G02F 1/133788 (2013.01); G02F 1/1303 (2013.01); G02F 1/1334 (2013.01); G02F 1/133351 (2013.01); G03F 1/32 (2013.01); G03F 1/42 (2013.01); G02F 1/133753 (2013.01); G02F 2001/13345 (2013.01); G02F 2001/133757 (2013.01);
Abstract

Disclosed is an apparatus for improving optical alignment of panels manufactured on a same mother substrate. The technical defect in the prior art which affects product quality can be eliminated. The apparatus for improving optical alignment of panels manufactured on a same mother substrate includes a mother substrate (), N columns of chips in a first group (), N columns of chips in a second group (), and a photomask (). The N columns of chips in the first group () and the N columns of chips in the second group () are arranged in an alternate manner and are arranged on the mother substrate (). An area of the chips in the second group () is larger than an area of the chips in the first group (). The photomask () covers the N columns of chips in the first group () and the N columns of chips in the second group () so that ultraviolet irradiates the N columns of chips in the first group () and the N columns of chips in the second group () after passing through the photomask (). N is a positive integer. The apparatus can be used in manufacturing of TFT-LCD.


Find Patent Forward Citations

Zhao, Li. (2020). Apparatus for improving optical alignment of panels manufactured on a same mother substrate (U.S. Patent No. 10718978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10718978

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