The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2020
Filed:
Feb. 26, 2018
Tianma Japan, Ltd., Kawasaki, Kanagawa, JP;
Tetsuroh Asakura, Kanagawa, JP;
Koji Shigemura, Kanagawa, JP;
TIANMA MICROELECTRONICS CO., LTD., Shenzhen, CN;
Abstract
A substrate laminating apparatus, including a first vacuum chamber including a first opening; a first table provided inside the first opening for holding a first substrate; a second vacuum chamber including a second opening; a second table provided inside the second opening for holding a second substrate, wherein the substrates are laminated by reducing a pressure in a closed space formed by having the first opening faced with the second opening. The apparatus also includes a vacuum evacuation unit connected to the first vacuum chamber or the second vacuum chamber and performs reduced-pressure evacuation of the closed space. When there is a direction along which priority is given on lamination precision when laminating the first and second substrates, and the direction is defined as a lamination precision priority direction, a reduced-pressure evacuation direction done by the vacuum evacuation unit is a direction different from the lamination precision priority direction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile