The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Dec. 18, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Michael Rizzolo, Delmar, NY (US);

Daniel C. Edelstein, White Plains, NY (US);

Theodorus E. Standaert, Clifton Park, NY (US);

Kisup Chung, Slingerlands, NY (US);

Isabel C. Chu, Westchester, NY (US);

John C. Arnold, North Chatham, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/12 (2006.01); H01L 43/02 (2006.01); H01L 27/22 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01); H01L 27/222 (2013.01); H01L 43/02 (2013.01);
Abstract

Multilayered hardmask structures are provided which can prevent degradation of the performance of a magnetic tunnel junction (MTJ) structure. The multilayered hardmask structures include at least a halogen barrier hardmask layer and an upper hardmask layer. The halogen barrier hardmask layer can prevent halogen ions that are used to pattern the upper hardmask layer from diffusing into the MTJ structure.


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