The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Feb. 07, 2018
Applicant:

Alpha and Omega Semiconductor (Cayman) Ltd., Grand Cayman, KY;

Inventor:

Sik Lui, Sunnyvale, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 27/06 (2006.01); H01L 21/265 (2006.01); H01L 27/07 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4236 (2013.01); H01L 21/265 (2013.01); H01L 27/0629 (2013.01); H01L 27/0727 (2013.01); H01L 29/66492 (2013.01); H01L 29/66666 (2013.01); H01L 29/7827 (2013.01); H01L 29/7833 (2013.01);
Abstract

A trench metal-oxide-semiconductor field-effect transistor (MOSFET) device, comprising a substrate of a first conductivity type, a body region of a second conductivity type, a gate electrode formed in a gate trench extending in the body region and substrate, a lightly doped source region and a heavily doped source region formed in the body region, and a trench contact extending to the body region formed in a contact trench. A contact implant of the second conductivity type is formed surrounding a bottom portion of the contact trench and it also forms surrounding sidewall portions of the contact trench where it contacts with the lightly doped source region to form a PN diode.


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