The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Oct. 13, 2017
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Shuang Sun, Beijing, CN;

Fangzhen Zhang, Beijing, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/786 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); H01L 21/31116 (2013.01); H01L 21/32136 (2013.01); H01L 27/1248 (2013.01); H01L 29/66969 (2013.01); H01L 29/7869 (2013.01);
Abstract

The disclosure discloses a thin film transistor, a method for fabricating the same, and a display device so as to avoid a source and a drain from being oxidized while the thin film transistor is being fabricated, to thereby improve the performance of the thin film transistor. The method for fabricating a thin film transistor includes: forming an active layer pattern on a base substrate, and a source-drain metal layer located above the active layer pattern and with a same pattern as the active layer pattern, using one patterning process; forming a first insulation layer above the source-drain metal layer; and patterning the source-drain metal layer and the first insulation layer using one patterning process so that portion of the active layer pattern corresponding to a channel area is exposed to form a source pattern and a drain pattern.


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