The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Mar. 19, 2019
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Hideki Horita, Toyama, JP;

Masato Terasaki, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02304 (2013.01); C23C 16/401 (2013.01); C23C 16/455 (2013.01); C23C 16/45553 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02211 (2013.01); H01L 21/02592 (2013.01); H01L 21/02667 (2013.01);
Abstract

According to one of the embodiments of the present disclosure, there is provided a technique that includes: (a) forming a seed layer in an amorphous state on a substrate by supplying a source gas to the substrate; (b) polycrystallizing the seed layer by processing the seed layer by heat; and (c) performing a cycle a predetermined number of times to form an oxide film on a polycrystallized seed layer and to oxidize the polycrystallized seed layer, the cycle including: (c-1) supplying the source gas to the substrate; and (c-2) supplying an oxygen-containing gas and a hydrogen-containing gas to the substrate, wherein (c-1) and (c-2) are non-simultaneously performed.


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