The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Sep. 17, 2018
Applicant:
Kokusai Electric Corporation, Tokyo, JP;
Inventors:
Tsukasa Kamakura, Toyama, JP;
Kazuhiro Morimitsu, Toyama, JP;
Hideharu Itatani, Toyama, JP;
Eisuke Nishitani, Toyama, JP;
Shun Matsui, Toyama, JP;
Assignee:
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); C23C 16/34 (2006.01); C23C 16/505 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/345 (2013.01); C23C 16/4557 (2013.01); C23C 16/4586 (2013.01); C23C 16/45542 (2013.01); C23C 16/45565 (2013.01); C23C 16/505 (2013.01); H01J 37/32458 (2013.01); H01J 37/32724 (2013.01); H01J 37/32834 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01); H01L 21/02274 (2013.01);
Abstract
There is provided a technique that includes supplying a first process gas to a process space where a substrate is accommodated, and using an inert gas as a carrier gas of the first process gas; and supplying plasma of a second process gas to the process space where the substrate is accommodated, and using an active auxiliary gas as a carrier gas of the second process gas.