The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Sep. 03, 2019
Applicant:

Nanowear Inc., Brooklyn, NY (US);

Inventors:

Vijay Varadan, State College, PA (US);

Pratyush Rai, State College, PA (US);

Gyanesh Mathur, State College, PA (US);

Assignee:

NANOWEAR INC., Brooklyn, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/28 (2006.01); G01Q 30/02 (2010.01); G01Q 30/04 (2010.01); B82Y 35/00 (2011.01); G01Q 60/42 (2010.01); G01Q 60/30 (2010.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01Q 30/02 (2013.01); G01Q 30/04 (2013.01); H01J 37/20 (2013.01); B82Y 35/00 (2013.01); G01Q 60/30 (2013.01); G01Q 60/42 (2013.01); H01J 2237/2803 (2013.01); H01J 2237/2814 (2013.01);
Abstract

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.


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