The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Dec. 11, 2017
Applicant:

Lumentum Operations Llc, Milpitas, CA (US);

Inventors:

John Michael Miller, Ottawa, CA;

Stephen Bagnald, Ottawa, CA;

Assignee:

Lumentum Operations LLC, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/11 (2015.01); G02B 1/115 (2015.01); G02B 5/18 (2006.01); G02B 27/44 (2006.01); G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); G02B 5/1866 (2013.01); G02B 5/1871 (2013.01); G02B 27/44 (2013.01); G02B 27/4272 (2013.01);
Abstract

An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.


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