The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Jun. 04, 2018
Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;
Shuuichi Doi, Isehara, JP;
FUJITSU LIMITED, Kawasaki, JP;
Abstract
An X-ray diffraction analysis method includes, placing a sample on a sample stage and acquiring a two-dimensional X-ray diffraction image from the sample using a two-dimensional detection circuit by irradiating the sample with an X-ray in a state where an X-ray irradiation angle is fixed, specifying a collection of diffraction spots having a predetermined range of diffraction angles from the X-ray diffraction image as a diffraction spot group, counting the number of diffraction spots having predetermined intensity or more in the diffraction spot group, grouping the diffraction spot group based on the number of diffraction spots, and identifying a crystal phase contained in the sample based on a diffraction angle of the grouped diffraction spot group.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile