The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Feb. 10, 2011
Jürgen Ramm, Maienfeld, CH;
Beno Widrig, Bad Ragaz, CH;
Jürgen Ramm, Maienfeld, CH;
Beno Widrig, Bad Ragaz, CH;
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON, Pfäffikon SZ, CH;
Abstract
In these investigations, an attempt has been made to correlate the deposition parameters of the reactive cathodic arc evaporation with processes at the surface of the composite Al—Cr targets and the nucleation and phase formation of the synthesized Al—Cr—O layers. The oxygen partial pressure and the pulsed operation of the arc current influence the formation of intermetallic phases and solid solutions at the target surface. The nucleation of the ternary oxides at the substrate site appears to be, to some extent, controllable by the intermetallics or solid solutions formed at the target surface. A specific nucleation process at substrate site can therefore be induced by the free choice of target composition in combination with the partial pressure of the oxygen reactive gas. It also allows the control over the oxide island growth at the target surface which occurs occasionally at higher oxygen partial pressure. This hypothesis is supported by the X-ray diffraction analysis of the layers as well as of the target surface.