The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Jan. 26, 2017
Applicant:
Sharp Kabushiki Kaisha, Sakai, Osaka, JP;
Inventors:
Shinichi Kawato, Sakai, JP;
Manabu Niboshi, Sakai, JP;
Eiji Koike, Sakai, JP;
Satoshi Inoue, Sakai, JP;
Tsuyoshi Inoue, Sakai, JP;
Yuhki Kobayashi, Sakai, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Sakai, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/56 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/24 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/56 (2013.01);
Abstract
A vapor deposition mask including a metallic substrate provided with a plurality of openings for passing vapor deposition particles, wherein at least a portion of the plurality of openings are structured by one or more opening groups in which the plurality of openings are repeatedly arranged in accordance with a constant rule, and a plurality of protrusions of identical height are arranged to support the entire substrate from one side, and are provided only outside the opening group formation region.