The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Aug. 17, 2016
Agency for Science, Technology and Research, Singapore, SG;
Agency for Science, Technology and Research, Singapore, SG;
Abstract
This invention relates to a photoinitiator compound comprising: a polyhedral oligomeric silsesquioxane (POSS) moiety and a photoinitiator moiety, wherein the photoinitiator compound having the structure according to formula (I): [R—SiO](I), wherein n is 6, 8, 10 or 12 and R is independently selected from the group consisting of H, linear or branched (hetero)alkyl, linear or branched (hetero)alkenyl, (hetero)aryl, (hetero)alkyl aryl, (hetero)aryl alkyl and a photoinitiator moiety, wherein at least one R is a photoinitiator moiety and the photoinitiator compound is a nanoparticle. The present invention also relates to a method for the production of the photoinitiator compound of the invention, a photopolymerizable composition comprising the photoinitiator compound of the invention, the use of the photoinitiator compound of the invention for photopolymerization. The present invention is further related to a coated substrate comprising the photopolymerizable composition of the invention.