The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Jun. 19, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Rajkumar Thanu, Santa Clara, CA (US);

Damon K. Cox, Jarrell, TX (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B65G 47/91 (2006.01); B25J 9/00 (2006.01); B25J 15/06 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B65G 47/918 (2013.01); B25J 9/0087 (2013.01); B25J 15/0616 (2013.01); H01L 21/6719 (2013.01); H01L 21/67196 (2013.01); H01L 21/68707 (2013.01); B65G 2201/0297 (2013.01);
Abstract

A processing system includes a robot arm with an end effector having a longitudinal axis, the robot arm having a reach of at least 45 inches, wherein the end effector includes: a first wafer pocket defined within the end effector at a first location along the longitudinal axis, wherein the first wafer pocket has the reach of at least 45 inches; and a second wafer pocket defined within the end effector at a second location along the longitudinal axis, wherein the second wafer pocket has a second reach that is less than 45 inches. The end effector is capable of concurrently carrying a first wafer in the first wafer pocket and a second wafer in the second wafer pocket.


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