The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2020

Filed:

Dec. 14, 2017
Applicant:

United Technologies Corporation, Farmington, CT (US);

Inventors:

Mary Lynn Tall, Rocky Hill, CT (US);

Matthew A. Mertens, West Hartford, CT (US);

Assignee:

United Technologies Corporation, Farmington, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 7/34 (2006.01); B28B 7/00 (2006.01); B29C 64/10 (2017.01); G01M 13/00 (2019.01); F01D 21/00 (2006.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); B28B 7/18 (2006.01);
U.S. Cl.
CPC ...
B28B 7/346 (2013.01); B28B 7/0008 (2013.01); B28B 7/0011 (2013.01); B28B 7/348 (2013.01); B29C 64/10 (2017.08); F01D 21/003 (2013.01); G01M 13/00 (2013.01); B28B 7/18 (2013.01); B33Y 10/00 (2014.12); B33Y 80/00 (2014.12); F05D 2240/80 (2013.01);
Abstract

A monolithic airflow testing mold suitable for mating with a workpiece includes a platform portion formed from a first material having a first hardness. The mold further includes a workpiece mating portion surrounding by the platform portion. The mating portion includes a support region abutting the platform portion and formed from a second material having a second hardness, and a sealing surface positioned above the support region and formed from a third material having a third hardness. The sealing surface is configured to mate with and extend into a hollow portion of the workpiece. The first hardness is different from at least one of the second and third hardnesses.


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