The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Dec. 29, 2017
Applicant:

Innolux Corporation, Miao-Li County, TW;

Inventors:

Yan-Syun Wang, Miao-Li County, TW;

Chi-Che Tsai, Miao-Li County, TW;

Wei-Yen Wu, Miao-Li County, TW;

I-Yin Li, Miao-Li County, TW;

Assignee:

INNOLUX CORPORATION, Miao-Li County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H05K 3/10 (2006.01); H01P 3/08 (2006.01); H05K 3/22 (2006.01);
U.S. Cl.
CPC ...
H05K 1/024 (2013.01); H01P 3/08 (2013.01); H05K 1/0296 (2013.01); H05K 3/10 (2013.01); H05K 3/22 (2013.01); H05K 1/0219 (2013.01); H05K 2201/0187 (2013.01); H05K 2201/09336 (2013.01); H05K 2203/107 (2013.01);
Abstract

A high-frequency electronic device including a dielectric substrate, a first patterned metal layer and a second patterned metal layer is provided. The dielectric substrate has a first region and a second region. The first patterned metal layer is disposed on a first side of the dielectric substrate and corresponds to the first region, wherein the first region and the second region have different etching rates with respect to an etching solution. The second patterned metal layer is disposed on the first side or a second side opposite to the first side of the dielectric substrate.


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