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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10707486 B1

PDFFull Text
Date of Patent:
Jul. 07, 2020

Filed:

Aug. 10, 2016

Process for making a cathode active material and a precursor therefore, cathode active material and its use

Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Simon Schroedle, Ludwigshafen, DE;

Thomas Michael Ryll, Heddesheim, DE;

Aleksei Volkov, Ludwigshafen, DE;

Ji-Yong Shin, Mannheim, DE;

Jordan K. Lampert, Cleveland, OH (US);

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
H01M 4/52 (2010.01); H01M 4/525 (2010.01); C01G 53/00 (2006.01); H01M 4/505 (2010.01); H01M 4/131 (2010.01); C01G 53/04 (2006.01); H01M 10/0525 (2010.01); H01M 10/0567 (2010.01); H01M 10/42 (2006.01); H01M 10/052 (2010.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/525 (2013.01); C01G 53/006 (2013.01); C01G 53/04 (2013.01); C01G 53/50 (2013.01); H01M 4/131 (2013.01); H01M 4/505 (2013.01); H01M 10/0525 (2013.01); C01P 2002/50 (2013.01); C01P 2002/52 (2013.01); C01P 2002/54 (2013.01); C01P 2004/32 (2013.01); C01P 2004/50 (2013.01); C01P 2004/51 (2013.01); C01P 2004/61 (2013.01); C01P 2006/11 (2013.01); C01P 2006/12 (2013.01); C01P 2006/40 (2013.01); H01M 10/052 (2013.01); H01M 10/0567 (2013.01); H01M 10/4235 (2013.01); H01M 2004/028 (2013.01);
Abstract

The present invention is directed towards a process for making a particulate material according to the general formula (I): NiCOMnM(O)(OH), wherein M is selected from Al and Ti, x is in the range of from 0.01 to 0.9, y is in the range of from 1.1 to 1.99, a is in the range of from 0.3 to 0.85, b is in the range of from 0.05 to 0.4, c is in the range of from 0.1 to 0.5, d is in the range of from 0.001 to 0.03, with a+b+c+d=1 said process comprising the following steps: (a) providing an aqueous slurry of particles of aluminum hydroxide or titanium dioxide, (b) adding an aqueous solution of water-soluble salts of nickel, cobalt and manganese and a solution of alkali metal hydroxide to the slurry according to step (a), thereby co-precipitating a layer of a mixed hydroxide of nickel and cobalt and manganese hydroxide on the particles according to step (a), (c) removing particles of (NiCOMnAl)(OH)or (NiCOMnTi)(OH)so obtained and drying them in the presence of oxygen.

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