The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Oct. 30, 2015
Applicant:

The Regents of the University of Colorado, a Body Corporate, Denver, CO (US);

Inventors:

Se-Hee Lee, Denver, CO (US);

Jerry Martin, Arvada, CO (US);

Vinay Bhat, Arvada, CO (US);

Daniela Molina Piper, Denver, CO (US);

Tyler Evans, Denver, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/36 (2006.01); H01M 4/38 (2006.01); H01M 10/0525 (2010.01); H01M 4/62 (2006.01); H01M 10/0566 (2010.01); H01M 4/134 (2010.01); H01M 4/525 (2010.01); H01M 4/505 (2010.01); H01M 4/131 (2010.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/366 (2013.01); H01M 4/134 (2013.01); H01M 4/386 (2013.01); H01M 4/622 (2013.01); H01M 10/0525 (2013.01); H01M 10/0566 (2013.01); H01M 4/131 (2013.01); H01M 4/505 (2013.01); H01M 4/525 (2013.01); H01M 2004/021 (2013.01); H01M 2300/0045 (2013.01);
Abstract

The disclosure includes a composition of matter including a film formed on substantially all nSi-cPAN particles included in an electrode, the film including fluorine, oxygen, sulfur, carbon and lithium.


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