The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Sep. 07, 2018
Applicant:

Semiconductor Components Industries, Llc, Phoenix, AZ (US);

Inventor:

Andrei Konstantinov, Sollentuna, SE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/06 (2006.01); H01L 21/04 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7806 (2013.01); H01L 21/046 (2013.01); H01L 21/0485 (2013.01); H01L 21/0495 (2013.01); H01L 29/0634 (2013.01); H01L 29/1095 (2013.01); H01L 29/1608 (2013.01); H01L 29/66068 (2013.01);
Abstract

In a general aspect, a silicon carbide (SiC) rectifier can include a substrate of a first conductivity type, a drift region of the first conductivity type, a junction field effect transistor (JFET) region of the first conductivity type, a body region of a second conductivity type, an anode implant region of the first conductivity type, and a channel of the first conductivity type. The channel can be in contact with and disposed between the JFET region and the anode implant region. A portion of the channel between the anode implant region and the JFET region can be disposed in the body region, The channel can be configured to be off under zero-bias conditions, and on at a positive turn-on voltage.


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