The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Mar. 05, 2018
Applicant:

The Chinese University of Hong Kong, Hong Kong, CN;

Inventors:

Shih-Chi Chen, Hong Kong, CN;

Hiu Hung Lee, Hong Kong, CN;

Dapeng Zhang, Hong Kong, CN;

Erxuan Zhao, Hong Kong, CN;

Yina Chang, Hong Kong, CN;

Dihan Chen, Hong Kong, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/06 (2014.01); B23K 26/03 (2006.01); B23K 26/067 (2006.01); B23K 26/38 (2014.01); B23K 26/0622 (2014.01); B23K 26/04 (2014.01); B23K 26/14 (2014.01); B23K 26/08 (2014.01); H01L 21/78 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); B23K 26/03 (2013.01); B23K 26/032 (2013.01); B23K 26/048 (2013.01); B23K 26/0622 (2015.10); B23K 26/0624 (2015.10); B23K 26/0626 (2013.01); B23K 26/0652 (2013.01); B23K 26/0661 (2013.01); B23K 26/0665 (2013.01); B23K 26/0673 (2013.01); B23K 26/0676 (2013.01); B23K 26/08 (2013.01); B23K 26/1476 (2013.01); B23K 26/38 (2013.01); H01L 21/268 (2013.01); H01L 21/67092 (2013.01);
Abstract

Systems and methods for dicing a sample by a Bessel beam matrix are disclosed. The method for dicing a sample by a Bessel beam matrix may comprise generating a Bessel beam matrix including multiple Bessel beams arranged in a matrix form, according to a predetermined dicing layout of the sample; controlling a focus position of each Bessel beam in the generated Bessel beam matrix; and focusing simultaneously the Bessel beams of the Bessel beam matrix at the respective controlled focus positions within the sample for dicing.


Find Patent Forward Citations

Loading…