The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Feb. 27, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masahiro Tamura, Utsunomiya, JP;

Takuro Yamazaki, Inagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); G03F 7/0002 (2013.01);
Abstract

There is provided a method for use in molding an imprint material supplied onto a substrate with a mold to form a pattern on the substrate, the method comprising steps of: with respect to each of regions obtained by dividing a region of the mold based on information of a pattern of the mold, obtaining first information of a first arrangement pattern of the imprint material based on information of the pattern of the mold; obtaining second information of a second arrangement pattern of the imprint material based on information of a thickness of a residual layer of the pattern to be formed on the substrate; and obtaining third information of a third arrangement pattern of the imprint material to be arranged on the substrate based on the first information and the second information.


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