The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Apr. 28, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Tsukasa Yamanaka, Shizuoka, JP;
Takashi Kawamoto, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); B65D 25/14 (2006.01); B65D 85/00 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/32 (2013.01); B65D 25/14 (2013.01); B65D 85/70 (2013.01); G03F 7/325 (2013.01); G03F 7/70 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01);
Abstract
According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.