The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Jun. 07, 2018
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Mo Chen, Beijing, CN;
Li-Hui Zhang, Beijing, CN;
Qun-Qing Li, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Abstract
A method of making a grating, the method including: providing a substrate, placing a first photoresist layer on the substrate, locating a second photoresist layer on the first photoresist layer, wherein a second exposure dose of the second photoresist layer is greater than a first exposure dose of the first photoresist layer; exposing the first photoresist layer and the second photoresist layer; developing the first photoresist layer and the second photoresist layer and removing an exposed photoresist to form a patterned photoresist layer and obtain an exposed surface of the substrate, wherein the patterned photoresist layer defines a plurality of top surfaces and a plurality of side surfaces, each adjacent top surface and side surface, and the exposed surface form a Z-type surface; depositing a preformed layer on the Z-type surface to form a Z-type structure; removing the patterned photoresist layer.