The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Sep. 25, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Yoshihiro Shiode, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 9/00 (2006.01); B29C 59/02 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G11B 5/855 (2006.01); B29K 101/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 59/026 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 9/703 (2013.01); G03F 9/7023 (2013.01); G03F 9/7049 (2013.01); G11B 5/855 (2013.01); B29C 2059/023 (2013.01); B29K 2101/00 (2013.01);
Abstract

The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.


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