The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Mar. 31, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
Kohei Wakabayashi, Toyama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate using a mold, the apparatus comprising a deformation unit configured to deform at least one of the mold and the substrate, and a control unit configured to control a process of starting contact between the mold and the imprint material in a state in which the at least one is deformed, and then gradually increasing a contact area between the mold and the imprint material by gradually decreasing a deformation amount of the at least one, wherein the control unit controls relative positions of the mold and the substrate based on the deformation amount, so as to maintain a relative positional relationship between the mold and the substrate at a region where the mold and the imprint material are contact with each other.