The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Aug. 21, 2018
Applicant:
Sumitomo Electric Industries, Ltd., Osaka-shi, Osaka, JP;
Inventor:
Kyoko Okita, Itami, JP;
Assignee:
SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka-shi, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01); C30B 33/10 (2006.01); C30B 29/36 (2006.01); H01L 21/02 (2006.01); C30B 33/00 (2006.01); B24B 37/04 (2012.01); H01L 21/04 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); H01L 29/16 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
C30B 33/10 (2013.01); B24B 37/042 (2013.01); C30B 29/36 (2013.01); C30B 33/00 (2013.01); H01L 21/02008 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/0475 (2013.01); H01L 21/304 (2013.01); H01L 21/30625 (2013.01); H01L 21/67057 (2013.01); H01L 29/1608 (2013.01);
Abstract
A method for manufacturing a silicon carbide substrate includes steps of preparing a silicon carbide substrate having a main surface, polishing the main surface of the silicon carbide substrate using a polishing agent containing a metal catalyst, and cleaning the silicon carbide substrate after the step of polishing. The step of cleaning includes a step of cleaning the silicon carbide substrate with aqua regia.