The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Dec. 14, 2018
Applicant:

Markem-imaje Corporation, Keene, NH (US);

Inventors:

Andrew Yohn, Keene, NH (US);

Mikael Palmén, Lidome, SE;

Assignee:

Markem-Imaje Corporation, Keene, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/04 (2006.01); B41J 2/075 (2006.01); B41J 3/407 (2006.01);
U.S. Cl.
CPC ...
B41J 2/075 (2013.01); B41J 2/04 (2013.01); B41J 3/407 (2013.01);
Abstract

A method for enabling marking of a pattern on a substrate with an industrial printer includes executing a genetic algorithm based on the pattern to be marked on the substrate. A result of the genetic algorithm indicates a resulting path which the industrial printer should follow when marking the pattern on the substrate. It is determined if the resulting path fulfills at least one criterion of: the resulting path matches an optimal path for marking the pattern, the resulting path substantially matches the optimal path, or a time spent for executing the genetic algorithm has reached or exceeded a threshold.


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