The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10703022 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 07, 2020

Filed:

May. 20, 2017
Applicant:

Nanchang O-film Optical Technology Co., Ltd, Nanchang, CN;

Inventors:

Wei Liu, Nanchang, CN;

Genchu Tang, Nanchang, CN;

Bin Tang, Nanchang, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 33/30 (2006.01); B32B 37/06 (2006.01); B32B 37/00 (2006.01); H01L 21/00 (2006.01); B29C 33/00 (2006.01); B29C 33/02 (2006.01); B29C 33/04 (2006.01); B29C 43/02 (2006.01); B29C 65/00 (2006.01); C08J 5/12 (2006.01);
U.S. Cl.
CPC ...
B29C 33/301 (2013.01); B29C 33/0088 (2013.01); B29C 33/02 (2013.01); B29C 33/046 (2013.01); B29C 33/302 (2013.01); B29C 43/021 (2013.01); B29C 66/301 (2013.01); B32B 37/00 (2013.01); B32B 37/06 (2013.01); H01L 21/00 (2013.01); B29C 66/00143 (2013.01); B29C 66/02 (2013.01); C08J 5/121 (2013.01);
Abstract

A device for attaching a decorative film to a surface of a 3D glass, includes a vacuum chamber, an upper mould, and a lower mould. The upper mould includes an upper planar pressing portion and an upper curved portion. The lower mould includes a lower planar pressing portion and a lower curved portion, the upper planar pressing portion and the lower planar pressing portion are configured to correspond to a planar portion of the 3D glass, the upper curved portion and the lower curved portion are configured to correspond to a curved portion of the 3D glass, the upper mould is provided with a first heating block. The present disclosure further discloses a method thereof.


Find Patent Forward Citations

Loading…