The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Jan. 05, 2018
Applicant:
San Fang Chemical Industry Co., Ltd., Kaohsiung, TW;
Inventors:
Chung-Chih Feng, Kaohsiung, TW;
I-Peng Yao, Kaohsiung, TW;
Lyang-Gung Wang, Kaohsiung, TW;
Wei-Te Liu, Kaohsiung, TW;
Wen-Chieh Wu, Kaohsiung, TW;
Yung-Chang Hung, Kaohsiung, TW;
Assignee:
SAN FANG CHEMICAL INDUSTRY CO., LTD., Kaohsiung, TW;
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/22 (2012.01); B24D 3/32 (2006.01); B24B 37/24 (2012.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
B24B 37/22 (2013.01); B24B 37/24 (2013.01); B24D 3/32 (2013.01); H01L 21/30625 (2013.01);
Abstract
The present invention relates to a polishing having a polishing layer, an elastic base layer and a binder layer. The binder layer binds the elastic base layer to the polishing layer. A compressibility of the elastic base layer is greater than a compressibility of the polishing layer. The present invention further provides a polishing apparatus and a method for polishing a substrate.