The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Sep. 16, 2016
Applicant:

Shindengen Electric Manufacturing Co., Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Daisuke Arai, Saitama, JP;

Shigeru Hisada, Saitama, JP;

Mizue Kitada, Saitama, JP;

Takeshi Asada, Saitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0312 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/68 (2006.01); H02M 1/32 (2007.01); H02M 3/00 (2006.01); H02M 3/156 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7805 (2013.01); H01L 29/06 (2013.01); H01L 29/0634 (2013.01); H01L 29/0878 (2013.01); H01L 29/68 (2013.01); H01L 29/78 (2013.01); H01L 29/7802 (2013.01); H01L 29/7813 (2013.01); H02M 1/32 (2013.01); H02M 3/00 (2013.01); H02M 3/156 (2013.01); H02M 2001/322 (2013.01);
Abstract

A MOSFET used in a power conversion circuit including a reactor, a power source, the MOSFET, and a rectifier element, includes a semiconductor base substrate having an n-type column region and a p-type column region, the n-type column region and the p-type column region forming a super junction structure, the n-type column region and the p-type column region are formed such that a total amount of a dopant in the p-type column region is set higher than a total amount of a dopant in the n-type column region, and the MOSFET is configured to be operated in response to turning on of the MOSFET such that at a center of the n-type column region as viewed in a plan view, a low electric field region having lower field intensity than areas of the n-type column region other than the center of the n-type column region appears.


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