The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Jul. 23, 2018
Applicant:

Lapis Semiconductor Co., Ltd., Yokohama, JP;

Inventor:

Hisao Ohtake, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 27/02 (2006.01); H01L 23/60 (2006.01); H01L 21/8234 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0255 (2013.01); H01L 21/762 (2013.01); H01L 21/76224 (2013.01); H01L 21/823475 (2013.01); H01L 21/823493 (2013.01); H01L 23/60 (2013.01); H01L 27/027 (2013.01);
Abstract

An electrostatic protection element includes a substrate of a first conductivity type, an epitaxial layer formed on the substrate, the epitaxial layer being of a second conductivity type; a well formed on the epitaxial layer, the well being of the first conductivity type; a transistor formed inside of the well, the transistor including a drain region, a source region formed to face the drain region across a channel region, and a gate formed above the channel region so as to be insulated; and a well contact region of the first conductivity type disposed so as to form an opposing region where the drain region and the well contact region face each other while being separated by a prescribed distance in a direction parallel to at least an extension direction of the gate.


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