The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Apr. 25, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Atashi Basu, Menlo Park, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Ziqing Duan, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/762 (2006.01); H01L 21/3213 (2006.01); H01L 21/266 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76897 (2013.01); H01L 21/02244 (2013.01); H01L 21/02247 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/32133 (2013.01); H01L 21/76227 (2013.01); H01L 21/76879 (2013.01); H01L 21/266 (2013.01);
Abstract
Methods comprising depositing a film material to form an initial film in a trench in a substrate surface are described. The film is treated to expand the film to grow beyond the substrate surface.