The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Aug. 11, 2017
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Taiki Hinode, Kyoto, JP;

Sadamu Fujii, Kyoto, JP;

Rei Takeaki, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02087 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/02068 (2013.01); H01L 21/6708 (2013.01); H01L 21/6719 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01); B08B 3/08 (2013.01); H01L 21/02101 (2013.01);
Abstract

A substrate processing method includes a forcing member disposing step of disposing a facing member such that the facing member faces an upper surface of a horizontally held substrate; a space forming step of forming a space where movement of the atmosphere in from and out to an outside is restricted by the substrate, the facing member, and a guard that surrounds the substrate and the facing member in plan view; an inert gas supplying step of supplying an inert gas to the space; an interval adjusting step of adjusting an interval between the upper surface of the substrate and the facing member by relatively raising/lowering the facing member with respect to the substrate while maintaining the space; and a processing liquid supplying step of supplying a processing liquid to the upper surface of the substrate after the interval adjusting step.


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